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  • Nazon J., Sarradin J., Flaud V., Tedenac Jean-Claude, Fréty N.. Effects of processing parameters on the properties of tantalum nitride thin films deposited by reactive sputtering. Journal of Alloys and Compounds, Elsevier, 2007, on line, pp.Available online 13 October 2007. ⟨10.1016/j.jallcom.2007.10.027⟩
dc:date
  • 2007
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