About: Characterization of silicon nitride thin films used as stressor liners on CMOS FETs

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About: Characterization of silicon nitride thin films used as stressor liners on CMOS FETs Goto Sponge NotDistinct Permalink

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Author	Braccini, Muriel (19..-.... ; auteure en chimie) Volpi, Fabien (19..-.... ; physicien spécialiste de la science des matériaux) Raymond, Gaëtan (1981-.... ; auteur en génie des matériaux)
Bibliographic Citation	Raymond G., Morin Pascal, Devos A., Hess D.A., Braccini M., Volpi F.. Characterization of silicon nitride thin films used as stressor liners on CMOS FETs. 9th International Conference on Ultimate Integration of Silicon, ULIS 2008, 2008, Italy. pp.199-202, ⟨10.1109/ULIS.2008.4527173⟩
Title	Characterization of silicon nitride thin films used as stressor liners on CMOS FETs
dc:date	2008

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