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  • Pastore C., Gianesello F., Gloria D., Giraudin J.-C., Noblanc O., Benech Ph.. High Performance and High Current Integrated Inductors using a Double Ultra Thick Copper Module in an Advanced 65 nm RF CMOS Technology. SIRF 2009, Jan 2009, San Diego, Californie, United States
  • Gianesello F., Gloria D., Benech Ph.. High Performance and High Current Integrated Inductors using a Double Ultra Thick Copper Module in an Advanced 65 nm RF CMOS Technology. SIRF 2009, Jan 2009, San Diego, Californie, United States
  • Gianesello F., Gloria D., Benech Ph. . High Performance and High Current Integrated Inductors using a Double Ultra Thick Copper Module in an Advanced 65 nm R F C M O S Technology . S I R F 2009, Jan 2009, San Diego, Californie, United States
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  • High Performance and High Current Integrated Inductors using a Double Ultra Thick Copper Module in an Advanced 65 nm RF CMOS Technology
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  • 2009
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