AttributesValues
Author
Bibliographic Citation
  • Cattoni Andrea, Mailly Dominique, Dalstein Olivier, Faustini Marco, Seniutinas Gediminas, Rösner Benedikt, David Christian. Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist. Microelectronic Engineering, Elsevier, 2018, 193, pp.18-22. ⟨10.1016/j.mee.2018.02.015⟩
Title
  • Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist
dc:date
  • 2018
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