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Author
Bibliographic Citation
  • Caillau Mathieu, Cremillieu Pierre, Laurenceau Emmanuelle, Chevolot Yann, Leclercq Jean-Louis, Alekseev Sergei, Chevalier Céline, Delair Thierry . Fifty nanometer lines patterned into silica using water developable chitosan bioresist and electron beam lithography . Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics, 2017, 35 (6), pp.06GE01 . ⟨10.1116/1.4996870⟩
Title
  • Fifty nanometer lines patterned into silica using water developable chitosan bioresist and electron beam lithography
dc:date
  • 2017
Digital Object Identifier (DOI)
  • 10.1116/1.4996870
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