About: Mask effect in nano-selective- area-growth by MOCVD on thickness enhancement, indium incorporation, and emission of InGaN nanostructures on AlN-buffered Si(111) substrates   Goto Sponge  NotDistinct  Permalink

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  • El Gmili Y., Bonanno P., Sundaram S., Li Xiaojian, Puybaret R., Patriarche G., Pradalier C., Decobert J., Voss P., Salvestrini Jean-Paul, Ougazzaden A.. Mask effect in nano-selective- area-growth by MOCVD on thickness enhancement, indium incorporation, and emission of InGaN nanostructures on AlN-buffered Si(111) substrates. Optical Materials Express, OSA pub, 2017, 7 (2), ⟨10.1364/OME.7.000376⟩
  • El Gmili Y., Sundaram S., Pradalier C., Decobert J., Voss P., Salvestrini Jean-Paul, Ougazzaden A.. Mask effect in nano-selective- area-growth by MOCVD on thickness enhancement, indium incorporation, and emission of InGaN nanostructures on AlN-buffered Si(111) substrates. Optical Materials Express, OSA pub, 2017, 7 (2), ⟨10.1364/OME.7.000376⟩
Title
  • Mask effect in nano-selective- area-growth by MOCVD on thickness enhancement, indium incorporation, and emission of InGaN nanostructures on AlN-buffered Si(111) substrates
dc:date
  • 2017
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