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Bibliographic Citation
  • Mercier Frederic, Lay S., Pons Michel, Blanquet Elisabeth. Reactive chemical vapor deposition of heteroepitaxial Ti 1−x Al x N films. CrystEngComm, Royal Society of Chemistry, 2018, 20 (12), pp.1711 - 1715. ⟨10.1039/C7CE02129A⟩
dc:date
  • 2018
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