About: Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography

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About: Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography Goto Sponge NotDistinct Permalink

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Author	Laurenceau, Emmanuelle Chevalier, Céline (1984-.... ; informaticienne) Jonin, Christian (1969-....) Delair, Thierry (1958-....) Leclercq, Jean-Louis Chevolot, Yann (19..-....) Brevet, Pierre-François (1963-....) Caillau, Mathieu (1988-....) Bénichou, Emmanuel (19..-....) Soppera, Olivier (1974-....) Yeromonahos, Christelle (1984-....)
Bibliographic Citation	Caillau Mathieu, Chevalier Céline, Cremillieu Pierre, Delair Thierry, Soppera Olivier, Leuschel Benjamin, Ray Cédric, Moulin Christophe, Jonin Christian, Benichou Emmanuel, Brevet Pierre-Francois, Yeromonahos Christelle, Laurenceau Emmanuelle, Chevolot Yann, Leclercq Jean-Louis . Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography . SPIE Advanced Lithography, Feb 2018, San Jose, United States . pp.105870S, ⟨10.1117/12.2292312⟩ Caillau Mathieu, Chevalier Céline, Cremillieu Pierre, Delair Thierry, Soppera Olivier, Leuschel Benjamin, Ray Cédric, Moulin Christophe, Jonin Christian, Benichou Emmanuel, Brevet Pierre-Francois, Yeromonahos Christelle, Laurenceau Emmanuelle, Chevolot Yann, Leclercq Jean-Louis. Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography. SPIE Advanced Lithography, Feb 2018, San Jose, United States. pp.105870S, ⟨10.1117/12.2292312⟩
Title	Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography
dc:date	2018
Digital Object Identifier (DOI)	10.1117/12.2292312

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