About: https://hal.archives-ouvertes.fr/hal-02071864#id   Goto Sponge  NotDistinct  Permalink

An Entity of Type : owl:Thing, within Data Space : data.idref.fr associated with source document(s)

AttributesValues
Author
Bibliographic Citation
  • Reboh S., Barraud S., Loubet N., Bernier N., Audoit G., Rouvière J.-L., Augendre E., Li J., Gambacorti N.. Strain, stress, and mechanical relaxation in fin-patterned Si/SiGe multilayers for sub-7 nm nanosheet gate-all-around device technology. Applied Physics Letters, American Institute of Physics, 2018, 112 (5), pp.051901. ⟨10.1063/1.5010997⟩
  • Reboh S., Barraud S., Loubet N., Bernier N., Audoit G., Rouvière J.-L., Augendre E., Li J., Gambacorti N. . Strain, stress, and mechanical relaxation in fin-patterned Si/SiGe multilayers for sub-7 nm nanosheet gate-all-around device technology . Applied Physics Letters, 2018, 112 (5), pp.051901 . ⟨10.1063/1.5010997⟩
dc:date
  • 2018
Digital Object Identifier (DOI)
  • 10.1063/1.5010997
Faceted Search & Find service v1.13.91 as of Aug 16 2018


Alternative Linked Data Documents: ODE     Content Formats:       RDF       ODATA       Microdata      About   
This material is Open Knowledge   W3C Semantic Web Technology [RDF Data]
OpenLink Virtuoso version 07.20.3229 as of May 14 2019, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (70 GB total memory)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software