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Author
Bibliographic Citation
  • Yang Kai, de Sagazan Olivier, Pichon Laurent, Salaün Anne-Claire, Coulon Nathalie . Inductively Coupled Plasma Chemical Vapor Deposition for Silicon‐Based Technology Compatible with Low‐Temperature (≤220 °C) Flexible Substrates . physica status solidi (a), 2020, 217 (5), pp.1900556 . ⟨10.1002/pssa.201900556⟩
Title
  • Inductively Coupled Plasma Chemical Vapor Deposition for Silicon‐Based Technology Compatible with Low‐Temperature (≤220 °C) Flexible Substrates
dc:date
  • 2020
Digital Object Identifier (DOI)
  • 10.1002/pssa.201900556
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