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dcterms:bibliographicCitation
Nguyen A.P., Lüders U., Voiron F.. Study of the impact of h+ mobile ions on RF performances of PECVD TEOS silicon dioxide deposited at low temperature. ECS Journal of Solid State Science and Technology, IOP Science, 2016, 5 (10), pp.N77-N80. ⟨10.1149/2.0301610jss⟩
dcterms:title
Study of the impact of h+ mobile ions on RF performances of PECVD TEOS silicon dioxide deposited at low temperature
dc:date
2016