<https://hal.archives-ouvertes.fr/hal-01468754#id>	<http://id.loc.gov/vocabulary/relators/aut>	<http://www.idref.fr/070388741/id> .
<https://hal.archives-ouvertes.fr/hal-01468754#id>	<http://purl.org/dc/terms/bibliographicCitation>	"Mantoux Arnaud, Colisson A., Morel Bertrand, Devilliers Didier, Julien Christian, Groult Henri. Chemical and electrochemical stability of copper in molten KF-2HF. Henri Groult; Fr\u00E9d\u00E9ric Leroux; Alain Tressaud. Modern Synthesis Processes and Reactivity of Fluorinated Compounds, 3, Elsevier, pp.719-738, 2017, Progress in Fluorine Science Series, 978-0-12-803740-9" .
<https://hal.archives-ouvertes.fr/hal-01468754#id>	<http://purl.org/dc/terms/title>	"Chemical and electrochemical stability of copper in molten KF-2HF" .
<https://hal.archives-ouvertes.fr/hal-01468754#id>	<http://id.loc.gov/vocabulary/relators/aut>	<http://www.idref.fr/134392906/id> .
<https://hal.archives-ouvertes.fr/hal-01468754#id>	<http://id.loc.gov/vocabulary/relators/aut>	<http://www.idref.fr/089284127/id> .
<https://hal.archives-ouvertes.fr/hal-01468754#id>	<http://purl.org/dc/elements/1.1/date>	"2017" .