Bibliographic Citation
| - Boujamaa R., Pierre F., Renault O., Detlefs B., Zegenhagen J., Gros-Jean M., Bertin F., Dubourdieu Catherine. Study of the La-related dipole in TiN/LaOx/HfSiON/SiON/Si gate stacksusing hard X-ray photoelectron spectroscopy and backside mediumenergy ion scattering. Applied Surface Science, Elsevier, 2015, 335, pp.71
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