About: Hydrogen passivation of silicium/silicium oxide interface by atomic layer deposited Hafnium Oxide and impact of silicon oxide underlayer   Goto Sponge  NotDistinct  Permalink

An Entity of Type : owl:Thing, within Data Space : data.idref.fr associated with source document(s)

AttributesValues
Author
Bibliographic Citation
  • Oudot E., Gros-Jean M., Courouble K., Bertin F., Duru R., Rochat N., Vallée Corentin. Hydrogen passivation of silicium/silicium oxide interface by atomic layer deposited Hafnium Oxide and impact of silicon oxide underlayer. Journal of Vacuum Science and Technology A, 2018, 36 (01A116), ⟨10.1116/1.4999561⟩
Title
  • Hydrogen passivation of silicium/silicium oxide interface by atomic layer deposited Hafnium Oxide and impact of silicon oxide underlayer
dc:date
  • 2018
Faceted Search & Find service v1.13.91 as of Aug 16 2018


Alternative Linked Data Documents: ODE     Content Formats:       RDF       ODATA       Microdata      About   
This material is Open Knowledge   W3C Semantic Web Technology [RDF Data]
OpenLink Virtuoso version 07.20.3229 as of May 14 2019, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (70 GB total memory)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2025 OpenLink Software