About: Mismatch trends in 20nm gate-last bulk CMOS technology   Goto Sponge  NotDistinct  Permalink

An Entity of Type : owl:Thing, within Data Space : data.idref.fr associated with source document(s)

AttributesValues
Author
Bibliographic Citation
  • Rahhal Lama, Bajolet Aurélie, Manceau Jean-Philippe, Rosa Julien, Ricq Stéphane, Lassere Sebastien, Ghibaudo Gérard. Mismatch trends in 20nm gate-last bulk CMOS technology. 2014 15th International Conference on Ultimate Integration on Silicon (ULIS), Apr 2014, Stockholm, Sweden. pp.133-136, ⟨10.1109/ULIS.2014.6813916⟩
  • RahhalLama, BajoletAurélie, ManceauJean-Philippe, RosaJulien, RicqStéphane, LassereSebastien, GhibaudoGérard . Mismatch trends in 20nm gate-last bulk CMOS technology . 2014 15th International Conference on Ultimate Integration on Silicon (ULIS), Apr 2014, Stockholm, Sweden . pp.133-136, ⟨10.1109/ULIS.2014.6813916⟩
Title
  • Mismatch trends in 20nm gate-last bulk CMOS technology
dc:date
  • 2014
Digital Object Identifier (DOI)
  • 10.1109/ULIS.2014.6813916
Faceted Search & Find service v1.13.91 as of Aug 16 2018


Alternative Linked Data Documents: ODE     Content Formats:       RDF       ODATA       Microdata      About   
This material is Open Knowledge   W3C Semantic Web Technology [RDF Data]
OpenLink Virtuoso version 07.20.3229 as of May 14 2019, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (70 GB total memory)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software